Fabrication of WOx/HfO2 Bilayer RRAM Devices
B.Tech Project on resistive memory device fabrication and characterization
Guide: Prof. Veeresh Deshpande
Duration: Aug 2025 - Present
- Undergoing cleanroom training in photolithography, thin-film deposition (sputtering/ALD), annealing etc.
- Fabricating a W/WOₓ/HfO₂/Pt stack, performing DC and pulse programming over 100+ cycles to study SET/RESET behavior, endurance and retention
- Validating results using GENESTRA simulations